The Ion Beam Deposition (IBD) technique is not very widespread, but simple and very powerful methodic of thin film preparation, allowing to obtain high quality, smooth and very uniform films on big substrate areas by target ablation with high energy particles in high vacuum [1]. Our IBD setup was produced in Kaliningrad (Russia) by OKBM-TO group, and, the setup permanently upgrades by scientists and ingeneering group of REC "Functional Nanomaterials" individually for each project.

All in situ - one vacuum space - thin film structures growth and investigation tool.

Two complementary methods of formation nanoscale objects:

• Pulsed Laser Deposition (PLD);
• Atomic Layer Deposition (ALD).